A spin Coater uniformly applies photoresist by spinning the substrate at high speed, while a developer uses chemical solvents to dissolve the exposed photoresist, both used in the pattern transfer process in semiconductor and display panel manufacturing.
The printing pressure can be adjusted accurately according to the thickness of the material, and the printing speed can be adjusted. It provides 4 primary color areas and 4 light color areas to ensure that the pattern is clear and tidy.
