Photoresist Spinner

The photoresist spin Coater uses high-speed rotation of the substrate to uniformly spread the photoresist on the surface through centrifugal force. It is used in semiconductor manufacturing to coat photoresist films, ensuring the accuracy of subsequent lithography patterns.
Selection
When selecting, consider matching the substrate size with the rotational speed range, check the control precision of the spin-coating thickness, evaluate solvent compatibility and the exhaust system, and refer to equipment stability and maintenance costs.

Terms

Instruments

800Ppm concentration accurate and stable, photoresist Encasement to prevent ultraviolet oxidation, Encasement alone for easy on-site use, valid period of up to 5 years, temperature-controlled environment to ensure Reliability of data.

$ 154.00

Support 0~ 10000rpm Rotation speed and 200 ℃ heating, with 5-stage uniform glue Linear dispersion programming function, PTFE cavity with dry mechanical pump to ensure process Stability.

$ 5560.00

Rotation speed up to 8000rpm, support program-controlled homogeneous gel Linear dispersion storage, miniaturized design saves space, suitable for a variety of substrate coating.

$ 2090.00

Speed range 0~ 10000rpm, heating temperature up to 200 ℃, using intelligent temperature control and touch screen preset uniform glue Linear dispersion, simplify the operation process and ensure film uniformity.

$ 6205.00

Speed range 0~ 10000rpm, heating temperature up to 200 ℃, using touch screen preset uniform glue Linear dispersion, support diaMeter ≤ 8 inches substrate, simplify the operation process to improve the uniformity of film formation.

$ 6205.00

Adopt precision motor to achieve 10000rpm Rotation speed, support 5 segments Linear dispersion preset, equipped with 7 inch touch screen to simplify operation, suitable for diaMeter ≤ 8 inch substrate, ensure uniform coating of film.

$ 2494.00

Miniaturized design combines aluminum alloy structure with 304 stainless steel cavity, maximum Rotation speed of 8000 rpm, supports programmable homogenization and storage of multiple Linear dispersion, suitable for substrates with a diaMeter of ≤ 4 inches.

$ 1445.00

Miniaturized design equipped with precision motor, the highest Rotation speed of 10000rpm, Acceleration range of 100-5000rpm/s, support 5 Linear dispersion storage function, transparent cavity easy to observe the coating process.

$ 1461.00

Miniaturized design with PP cavity, Rotation speed up to 8000 rpm, Linear dispersion storage, suitable for diaMeter ≤ 4 inch substrate, easy to operate.

$ 1606.00

Precision motor to ensure uniform film formation, Speed range 0-10000rpm, Acceleration 100-5000rpm/s, Support preset Linear dispersion and touch screen operation, simplify the use process.

$ 2752.00

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