Overview
GREATWALL's ZT-50-200-30H closed refrigeration heating cycle device is a circulation device that can provide heat or cold sources. Its wide working interval can be used in chemical, biological and other industries to provide heat and cold sources for Reaction Kettles, tanks and other equipment.
Features
1. Wide temperature control range: -80 ° C to 200 ° C.
2. Pre-cooling system, refrigeration system and heating system can be used in combination.
3. Quick heating or chilling down.
4. The cooling rate is large, allowing for rapid cooling.
5. Fully closed circulation system, the heat transfer fluid is not easy to volatilize and oxidation at high temperature; it is not easily affected by environmental conditions at low temperature, which can prolong the service life of the heat transfer fluid.
6. The refrigeration heat exchanger uses a fully brazed plate heat exchanger, which takes up little space and has high heat exchange efficiency.
7. Liquid level display function, real-time monitoring of liquid level, to avoid the lack of heat transfer fluid.
8. Over-temperature protection, leakage protection, over-current protection, and other protective functions ensure the safety of users and equipment.
9. According to user requests, two pre-cooling models, Air-Cooled and Water-Cooled, can be provided.
Principle
The unit achieves rapid heating or chilling down through the joint work of the pre-cooling system, the refrigeration system and the heating system. Its fully enclosed circulation system makes the heat transfer fluid less volatile and oxidation at high temperatures and less susceptible to the environment at low temperatures, thus prolonging the service life. The refrigeration heat exchanger adopts an efficient fully brazed plate design to ensure heat transfer efficiency.
Applications
Temperature control of double-decked and three-layer Reaction Kettle in chemical and biological fields, temperature control in material testing, temperature control of distillation system, temperature change simulation control in process, thermostatic Control system, temperature control of semiconductor equipment, temperature control of thermal test platform, temperature control of vacuum chamber
Steps
The information does not mention the specific operation steps.
Notice
The information did not mention specific precautions.
