Overview
NBD NBD-HR1200-110IT-170 Rapid Annealing Furnace (RTP) is a kind of equipment independently developed on the basis of absorbing international advanced manufacturing technology, and has independent invention patents. The equipment has an extremely fast heating rate (500 ℃/S), and can directly take out the sample from the high temperature area after the process is completed to achieve the fastest cooling in the physical state. The cold wall process is used to realize the rapid rise and drop of the sample on the basis of green energy saving and environmental protection. The cavity adopts a double-decked structure with an inner tube inlet and an outer tube outlet, so that the reaction atmosphere is in full and uniform contact with the processed sample, which is an ideal tool for growing large-size two-dimensional graphene by CVD method. The temperature measuring element directly contacts the sample to ensure the accuracy of temperature measurement.
Features
1. Extremely high temperature of 500 ° C/S, extremely high temperature of 100 ° C/S.
2. Double-decked furnace tube structure makes the atmosphere more uniform in contact with the sample.
3. Direct measurement of sample surface temperature, more accurate temperature measurement.
4. The furnace can automatically move left and right according to the settings, which can meet more experimental applications.
5. Rich expansion interfaces to meet the needs of various tests.
Principle
The device uses rapid heat treatment (RTP) technology to achieve extremely fast heating through an efficient heating system. Its unique double-decked furnace tube structure (inner tube inlet, outer tube outlet) ensures that the reaction atmosphere flows evenly and fully contacts in the sample area. After the process, the cold wall process and the way of directly removing the sample from the high temperature area are used to achieve rapid cooling in the physical state. The temperature measuring element is directly in contact with the sample and accurately feeds back the sample surface temperature in real time.
Applications
Rapid thermal annealing (RTA), annealing after ion implantation, meteorological deposition such as graphene, epitaxial growth of carbon nanotubes, rapid thermal oxidation (RTO), thermal nitriding (RTN), silicification, diffusion, annealing after ion implantation, Electrode alloying, crystallization and hardening
