Product Overview
The device is designed for large-scale thin film preparation, and is suitable for round or Cube substrates of 16 inches (400mm) and below. Using high-torque precision motors and intelligent program control systems, uniform film thickness of nano to micron can be achieved on large-area flat substrates such as silicon wafers, Glass panels, Pottery and porcelain substrates, and metal sheets. Film thickness preparation is suitable for R & D pilot and small-scale production needs.
Product Features
1. Large size adaptation: support for the 400mm (16 inch) substrate, equipped with high torque brushless motor, to ensure a smooth start-stop and high-speed spin coating under large load. 2. High uniformity: speed accuracy up to +/- 1 rpm, acceleration can be precisely regulated to improve the film formation conformity in the surface of the large size substrate. 3. Intelligent program control: support 20 groups of program storage, each group can be set to 5 independent speed and acceleration, one key to call the common formula, reduce human error. 4. Safe and durable: the inner diameter of the cavity is sufficient (≥ 450mm), equipped with multiple safety mechanisms such as automatic shutdown with open cover and vacuum pressure alarm. 5. Flexible expansion: optional high temperature cavity (room temperature~ 200 ℃) to achieve the integration of spin coating and baking glue, or optional automatic glue pointing system, multi-station structure.
Working Principle
The device drives the substrate to swirl/spin at high speed through a large-torque brushless motor, and uses centrifugal force to spread the Spreader liquid evenly on the surface of the planar substrate. The intelligent programmable system precisely controls the speed and acceleration, and cooperates with the sealing cavity environment to realize the uniform film thickness of nano to micron. Film thickness is prepared.
application field
Semiconductors and pan-semiconductors (large-scale silicon wafers, Glass substrate photoresist Spreaders), new energy (large-area perovskite solar cells, fuel cell film preparation), optical coatings (Optical inspection filters, flat panel display device film preparation), materials science (large-area sol-gel film, polymer coating research)
Operation steps
1. Place the substrate on the vacuum chuck and start the Vacuum chuck. 2. Drop the desired solution in the center of the substrate. 3. Call the stored process program or manually set the speed and acceleration parameters. 4. Start the spin coating program, and the device automatically completes the swirl/spin coating. 5. Remove the substrate after the program. If necessary, it can be baked glue or subsequent processing.
Precautions
- Make sure there are no foreign objects in the cavity and the substrate is placed smoothly before operation. - Check whether the Vacuum chuck system and safety device are normal before use. - Avoid touching the inside of the cavity when swirling/spinning at high speed to prevent accidents. - Regularly clean the cavity and motor parts to prevent liquid residual corrosion. - Wear protective equipment and keep ventilated when using corrosive Spreader liquid. - Only substrates of suitable size (400mm and below) are recommended, exceeding the range may affect stability.
