Semiconductor Oven

The semiconductor oven heats the air inside the chamber using electric heating elements and ensures uniform temperature distribution through fan circulation. It is used in processes such as photoresist curing and wafer baking in semiconductor chip manufacturing, effectively removing solvents and enhancing material adhesion.
Selection
When selecting, focus on a temperature control accuracy of ±0.5℃, equipped with a nitrogen injection function to prevent oxidation. The chamber material should be stainless steel, and ensure uniform hot air circulation. Choose the effective volume based on the wafer size, and it must have over-temperature protection and data logging functions.

Terms

Standards

Instruments

Using semiconductor refrigeration technology implementation RT + 5~ 100 ℃ Temperature range, temperature control accuracy ≤ +/- 0.5 ℃, with 5 groups of programming functions and module Temperature uniformity ≤ +/- 0.3 ℃, compact design supports a variety of module replacement.

$ 808.00

Using semiconductor refrigeration technology, temperature control accuracy of +/- 0.5 ℃, cooling time only 10 minutes from 25 ℃ to 4 ℃, with automatic fault detection and over-temperature protection function, support a variety of centrifuge tube module selection.

$ 598.00

Using semiconductor Sensor technology, the detection sensitivity can be adjusted to 50PPM methane, Response Time ≤ 1 second, Warm-Up Time is less than 110 seconds, support 9 hours of continuous work, with LED light alarm and low power indication function.

$ 99.00

Integrated viscosity measurement and temperature control function, using semiconductor temperature control technology implementation +/- 0.1 ℃ accuracy, sample volume only 2-16ml, electric lifting system to ensure accurate positioning, support infinitely variable speed and rheological Linear dispersion programming.

$ 5881.00

Using semiconductor temperature control technology implementation +/- 0.1 ℃ accuracy, SC4 rotor only needs 2-16ml sample volume to complete accurate viscosity measurement, support infinitely variable speed and automatic lifting system operation is convenient.

$ 5881.00

With 8-channel High Accuracy Temperature Measurement, accuracy of +/- 0.3 ℃, using nano-aerospace environmentally friendly heat insulation material, can work continuously for 60 minutes in 200 ℃ environment, support multi-rate sampling and long-term data recording.

$ 1937.00

Application width 300mm, Spreader accuracy +/- 0.005mm, Drawdown blade can be quickly disassembled and cleaned, three independent temperature control oven to ensure uniform drying, suitable for a variety of substrates and Stock processing.

$ 24279.00

Temperature range -10~ 100 ℃ and accuracy +/- 0.5 ℃, support 5 point programming operation; use metal module to avoid pollution, with temperature calibrating and over-temperature protection functions, intuitive and reliable operation interface.

$ 808.00

Microcomputer temperature control technology, temperature control accuracy of +/- 0.5 ℃, support up to 5 temperature point programming operation, metal module design to avoid sample contamination and easy to clean and disinfect.

$ 430.00

Using semiconductor temperature control technology, accuracy of +/- 0.1 ℃, support 2-16ml small sample measurement, SC4 rotor provides accurate viscosity data, electric lifting and automatic temperature optimization program to shorten thermostatic time and improve experimental efficiency.

$ 5881.00

Temperature control accuracy of +/- 0.5 ℃, Temperature Uniformity +/- 0.3 ℃, with over-temperature protection and automatic fault detection function, transparent cover design for easy observation of the experimental process, module can be easily replaced and cleaned.

$ 848.00

Using dip coating process with double roll extrusion residual material, Spreader thickness adjustable, mechanical speed 0.1-1 m/min, Oven temperature 50-150 ℃ +/- 3 ℃, suitable for a variety of Coating Spreader.

$ 21051.00

With 9-channel temperature measurement capability, Measurement range covering -200 to 1370 ℃, using nano-aerospace environmentally friendly heat insulation material, support multi-directional temperature Linear dispersion tracking and Data analysis optimization process.

$ 2157.00

Semiconductor Sensor to detect halogen gas leaks of less than 0.5 oz/year, Response Time ≤ 1 second, Sensitivity adjustable, Portable design weighing 250g, up to 9 hours of operation.

$ 109.00

Temperature control accuracy up to +/- 0.5 ℃, Temperature Uniformity ≤ +/- 0.3 ℃, supports up to 5 point temperature programming operation, with over-temperature protection and automatic fault detection function.

$ 535.00

Articles

Research on the Stepwise Curing Process of Coatings Using Multi-Stage Temperature Control Ovens
This article investigates a novel process for achieving stepwise curing of coatings using a multi-stage temperature-controlled oven.
Evaluation of thermal aging life of hot melt adhesives using high-temperature oven method
This article introduces a method for evaluating the thermal aging life of hot melt adhesives using a high-temperature oven. The principle is based on the Arrhenius equation, where aging is accelerated by increasing the temperature to simulate performance changes under long-term use.
Thermogravimetric Analyzer for Determining the Solid Content of Coatings
Thermogravimetric analyzers determine the solid content of coatings by monitoring the change in sample mass with temperature, offering faster and more precise results compared to traditional oven methods.
Reliability testing of semiconductor equipment in high-temperature and high-humidity environments
Semiconductor equipment is prone to reliability issues such as material aging and electrochemical migration in high-temperature and high-humidity environments. Testing simulates harsh conditions and uses acceleration models to evaluate performance changes and reveal potential failure modes.
The Role of Roll-to-Roll Coating Machines in Photoresist Coating for Semiconductor Packaging
The roll-to-roll coating machine achieves efficient production through continuous unwinding, coating, and rewinding processes. It utilizes precise coating methods to control the thickness of the adhesive film and is suitable for coating materials such as flexible substrates.
What is the deviation between the moisture meter's rapid moisture measurement and the oven method?
This article primarily compares the differences between rapid moisture analyzers and traditional oven methods in measuring moisture. Understanding these differences helps in using rapid moisture analyzers more appropriately, ensuring data reliability while maintaining efficiency.
Key Technical Points for Determining Paper Moisture Using the 105℃ Oven Method
This article introduces the specific procedure for measuring paper moisture using the 105°C oven method. The process involves placing paper samples into a 105°C oven and drying them until their weight remains constant, then calculating the moisture content based on the weight difference before and after drying.
Oven combined with analytical balance for determination of solid content
This article introduces a method for determining the solid content of samples in the laboratory by combining an oven and an analytical balance.
Temperature gradient control in high-temperature ovens during thermal resistance testing.
The heat resistance test simulates the performance of materials under high temperatures using a high-temperature oven, and the accuracy of its results is highly dependent on the uniformity of temperature inside the oven. If the temperature gradient is poorly controlled, it can lead to uneven heating of samples from the same batch, compromising the validity of the test.
What are the differences between a vacuum oven and a conventional oven?
The main difference between a vacuum oven and a conventional oven lies in their working pressure. Conventional ovens operate at atmospheric pressure, heating through air convection, making them suitable for routine drying tasks. In contrast, vacuum ovens are evacuated to low pressure to reduce air presence, primarily relying on thermal radiation for heat transfer. This makes them ideal for processing heat-sensitive, oxidation-prone materials or those requiring thorough drying.
Natural Convection vs Forced Air Drying: What’s the Difference Between the Two "Schools" of Laboratory Ovens?
This article introduces two drying methods for laboratory ovens: natural convection and forced air drying. What are the differences between them?