Overview
TEELEN XTL-12B Inverted Metallurgical Microscopy uses professional metallographic objectives and flat field eyepieces to provide superior image mass, high resolution and observation comfort. The instrument has a stable and reliable mechanical structure, and can be equipped with photographic and video Accessories for image acquisition, preservation and metallographic analysis. Easy to operate and complete with Accessories.
Features
1. Use professional metallographic objective and flat field eyepiece, good imagery mass and high resolution.
2. Provide superior image mass and stable and reliable mechanical structure.
3. Optional Photography Accessories to support image acquisition, preservation and metallographic analysis.
4. Easy to operate, Accessories complete.
Principle
Illuminant with reflection Cora illumination system, Light intensity is continuously adjustable, and sample images are enlarged through objective and eyepiece for high-resolution observation. Optional Accessories are available for image acquisition and analysis.
Applications
Teaching and research Metallographic analysis, semiconductor silicon wafer testing, address mineral analysis, precision engineering measurement
Steps
1. Power on the lighting system.
2. Place the sample on the stage.
3. Use the focusing system for coarse and fine focusing.
4. Observe the image through the eyepiece.
5. Optional Accessories for image acquisition and analysis.
Notice
• Power supply voltage within 90V-240V range before use.
• Pay attention to coarse fine-tuning coaxial operation when focusing to avoid damage to the sample.
• Regularly check the lighting system to ensure that the Light intensity adjustable function is normal.
• Keep the stage and Optical inspection components clean to prevent contamination.
