GB/T 42789-2023 specifies the method for testing the glossiness of polished silicon wafer surfaces using gloss meters at specific angles (e.g., 75°). It characterizes the surface flatness and polishing quality of silicon wafers by measuring their specular reflection of light, and is used for process control in the semiconductor industry.
This summary is not the original standard text and is for reference only. For accurate information, please obtain it through official channels.
| Status | Active | ||
|---|---|---|---|
| CCS | H21 | ICS | 77.040 |
| Release Date | 2023-08-06 00:00:00 | Implementation Date | 2024-03-01 00:00:00 |
